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DFS Blog



CMP Slurry Blending with Closed-Loop Real-Time Control & Monitoring

Posted by DFS on Jul 23, 2021 9:02:53 AM

Remove Expensive Labor-Intensive Offline Metrologies and Manual Process Adjustments

DFS recently completed a process characterization and successfully developed onboard control technology that allows for closed-loop control of a customer-specific semiconductor cmp slurry solution in a blend and distribution operation.

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Topics: process control, chemical mechanical planarization, chemical blending, chemical blender