--- title: CMP Slurry Blending with Closed-Loop Real-Time Control & Monitoring description: DFS' new onboard control technology allows for closed-loop control and monitoring of cmp slurry solution in a blend and distribution operation. image: https://blog.cpsgrp.com/hubfs/CPSGrp_Feb2017/_Home/3%20blog%20images/DFS%20(HP%20Gas%20Gary)/dfs-fusion-chemical-blender.gif --- [![Logo DFS Exyte wht-1](https://blog.cpsgrp.com/hs-fs/hubfs/CPSGrp_Feb2017/_Home/1%20company%20brand%20elements/DFS/Logo%20DFS%20Exyte%20wht-1.png?width=250&height=61&name=Logo%20DFS%20Exyte%20wht-1.png "Logo DFS Exyte wht-1")](https://www.dfsolution.com) - [CHEMICAL SUPPLY](https://www.exentec.net/en/Products/Chemical-Supply) - [GAS SUPPLY](https://www.exentec.net/en/Products/Gas-Supply) - [BLOG](https://blog.cpsgrp.com/dfsolution) # Exentec Media Supply ## CMP Slurry Blending with Closed-Loop Real-Time Control & Monitoring Posted by [DFS](https://blog.cpsgrp.com/dfsolution/author/dfs) on Jul 23, 2021 9:02:53 AM Find me on: [LinkedIn](https://www.linkedin.com/company/5055621/) ### Remove Expensive Labor-Intensive Offline Metrologies and Manual Process Adjustments DFS recently completed a process characterization and successfully developed onboard control technology that allows for closed-loop control of a customer-specific semiconductor cmp slurry solution in a blend and distribution operation. ![CMP-Slurry-Blending-with-Closed-Loop-Real-Time-Control-and-Monitoring](https://blog.cpsgrp.com/hs-fs/hubfs/CPSGrp_Feb2017/_Home/3%20blog%20images/DFS%20(HP%20Gas%20Gary)/dfs-fusion-chemical-blender.png?width=708&height=514&name=dfs-fusion-chemical-blender.png)This newly patented DFS process and technology delivers: - Extreme accuracy regardless of incoming variation - Process characterization and validation - In-line metrology driven closed-loop control - Offline metrology independence - Precision blend control optimizing process control Semiconductor fabs have increasingly tight upper and lower control limits (UCL / LCL) for a number of critical process parameters. These parameters include concentration specific related functions, and many others as associated with blend and distribution operations of a given critical chemical action. To achieve this there have been major advances in metrology, varying in areas and principles; but many today are only offline measures or verifications, which are used to meet the required precision and accuracy for these control limits. To eliminate the need for offline instruments, DFS has a proven practice of process characterization, where it is possible to use various metrology devices, or combinations of these devices, to achieve the best-in-class in-line metrology driven control with the highest level of precision. DFS is able to use this concert of instruments to achieve real-time online results that have been proven to meet or exceed the levels seen by many offline methods. If you want to learn more about our newly patented process and technology, download our case study below: [![New call-to-action](https://no-cache.hubspot.com/cta/default/2835452/7eedcddc-5e46-42e7-ad09-05ef40337ff3.png)](https://cta-redirect.hubspot.com/cta/redirect/2835452/7eedcddc-5e46-42e7-ad09-05ef40337ff3) **OR** **[Click here to learn more about our semiconductor manufacturing solutions.](https://www.cpsgrp.com/semiconductor-manufacturing-solutions.php)** Topics: [process control](https://blog.cpsgrp.com/dfsolution/topic/process-control), [chemical mechanical planarization](https://blog.cpsgrp.com/dfsolution/topic/chemical-mechanical-planarization), [chemical blending](https://blog.cpsgrp.com/dfsolution/topic/chemical-blending), [chemical blender](https://blog.cpsgrp.com/dfsolution/topic/chemical-blender) ## Don't Lose Your Competitive Advantage ## Follow Our Blog To Keep Pace With The Latest... - Industry Standards - Thought Leaders - Ideas and Innovations - Products and Services - Guides and Practices ### Subscribe to Email Updates ### Recent Posts ### Posts by Topic - [process control (18)](https://blog.cpsgrp.com/dfsolution/tag/process-control) - [chemical blending (16)](https://blog.cpsgrp.com/dfsolution/tag/chemical-blending) - [gas systems (5)](https://blog.cpsgrp.com/dfsolution/tag/gas-systems) - [chemical distribution (4)](https://blog.cpsgrp.com/dfsolution/tag/chemical-distribution) - [chemical blender (2)](https://blog.cpsgrp.com/dfsolution/tag/chemical-blender) - [chemical blending and distribution (2)](https://blog.cpsgrp.com/dfsolution/tag/chemical-blending-and-distribution) - [chemical mechanical planarization (2)](https://blog.cpsgrp.com/dfsolution/tag/chemical-mechanical-planarization) - [chemical supply (2)](https://blog.cpsgrp.com/dfsolution/tag/chemical-supply) - [semiconductor manufacturing (2)](https://blog.cpsgrp.com/dfsolution/tag/semiconductor-manufacturing) - [ammonium hydroxide generation (1)](https://blog.cpsgrp.com/dfsolution/tag/ammonium-hydroxide-generation) - [gas abatement (1)](https://blog.cpsgrp.com/dfsolution/tag/gas-abatement) - [ultrapure water (1)](https://blog.cpsgrp.com/dfsolution/tag/ultrapure-water) see all - [Home](https://www.exentec.net/) - [About](https://www.exentec.net/About-Us) - [Contact](https://www.exentec.net/Contact) © 2026 Exentec ```json { "@context" : "https://schema.org", "@type" : "BlogPosting", "author" : { "@type" : "Person", "name" : "DFS", "url" : "https://blog.cpsgrp.com/dfsolution/author/dfs" }, "dateModified" : "2023-11-06T12:50:59.756Z", "datePublished" : "2021-07-23T13:02:53.000Z", "headline" : "CMP Slurry Blending with Closed-Loop Real-Time Control & Monitoring", "image" : [ "https://blog.cpsgrp.com/hubfs/CPSGrp_Feb2017/_Home/3%20blog%20images/DFS%20(HP%20Gas%20Gary)/dfs-fusion-chemical-blender.gif" ], "mainEntityOfPage" : { "@id" : "https://blog.cpsgrp.com/dfsolution/cmp-slurry-blending-with-closed-loop-real-time-control", "@type" : "WebPage" }, "publisher" : { "@type" : "Organization", "logo" : { "@type" : "ImageObject", "url" : "https://blog.cpsgrp.com/hubfs/email_header_fti.png" }, "name" : "Critical Process Systems Group" } } ```