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DFS Blog

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Karl Urquhart

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Recent Posts

On-site Chemical Blending Increases Overall IC Process Yield, When Done Right.

Posted by Karl Urquhart on Jul 11, 2018 12:06:00 PM

Precise control of chemical composition through use of on-site chemical blending and mixing systems improves overall IC process yield. 

This is accomplished by providing more consistent quality of materials that come into contact with the wafer and its forming circuits. 

On-site blending results in tighter assay control, higher purity, and lower particles. On-site blenders also allow users to test materials suppliers for comparison to optimize ROI and control cost. 

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Topics: chemical blending, IC manufacturing, semiconductor manufacturing

Mobile Chemical Blending Systems (MCBS) Help Overcome the Challenges of Next-Generation Chemicals

Posted by Karl Urquhart on Apr 12, 2018 2:10:49 PM

Uses and Benefits of Mobile Chemical Blending Systems (MCBS) 

A given factory's chemical formulations are pushed to: 1) improve affordability, while 2) requiring higher process performances in critical areas. One way to accomplish both goals is to target incoming chemical solutions that are high in concentrations and complexity.

Achieving the proper dilution and high performance in current and upcoming process nodes requires complex blends of organic and inorganic compounds in CMP slurry formulations. The combinations of all these factors result in products that have nuanced mixing and handling requirements.

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Topics: cmp process, chemical blending, semiconductor manufacturing

Precision Slurry Composition in Chemical Mechanical Planarization

Posted by Karl Urquhart on Mar 26, 2018 11:55:17 AM

Precise Slurry Requirements Increase CMP Process Windows but Necessitate greater dependence on Inline Metrology

Chemical Mechanical Planarization or Polishing (CMP) is the method of using chemical slurry formulations with mechanical polishing-pad-action to flatten conductive or dielectric materials on silicon wafers in semiconductor manufacturing.

The end goal is to achieve a flat enough surface aspect ratio as required by photolithography steps, where layers of integrated circuits are layered step by step. 

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Topics: process control, cmp process, chemical mechanical planarization, semiconductor manufacturing

Chemical Blend Uniformity and Semiconductor Process Yield

Posted by Karl Urquhart on Feb 27, 2018 4:25:48 PM

Characterization and importance of chemical mix uniformity, precision, and preservation of purity levels to reduce cost, prevent rework/scrap, and increase Process yield overall.

Manufacturers place a great deal of emphasis on cost reduction, prevention of rework or scrap, and increasing overall process yield. One result has been a rise in precision and control technology innovations geared towards process chemicals uniformity.

Many focus on individual aspects of metrology for quantitative, or qualitative determination, either by off-line or inline methods, with the intent to achieve the highest productivity at the lowest cost.

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Topics: chemical mixing and blending, process yield, semiconductor manufacturing